New ALD Valves : Standard and High-Temperature
We are expanding our line of components with a solution designed specifically for atomic layer deposition (ALD) processes.
Why the ALD valve ?
- Optimal speed: very short switching times thanks to the optimized integration of the control solenoid valve with the valve’s pneumatic actuator, which reduces the amount of compressed air required to open the valve.
- Thermal resistance: high-temperature version capable of withstanding the demands of ALD processes that use ALD precursors requiring temperatures above 70°C.
- UHP purity: compatible with the semiconductor industry’s standards…
- Typical applications: semiconductor manufacturing, decorative coatings (watchmaking industry), protective coatings (vacuum process machines), optical coatings and any production line requiring control of ALD precursor flow.
This valve is therefore an essential component for UHP production lines, combining speed, thermal reliability, and maximum purity.
Availability: Technical data sheets are now available.
For more information or technical assistance, contact our team.